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Chemical Polishing

Chemical polishing of refractory metals is often performed after mechanical polishing to improve polarised light response eg, for Zr, Hf , or to remove minor deformation eg, Nb, Ta, V In general, a ground specimen is immersed in the polishing agent, or swabbed with the solution, until a polish is obtained, and it is then etched or .

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Belarusian investigation into use of chemicals at Polish ,

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CMP Slurries for Increasingly Complex Process Requirements

The chemical mechanical planarization CMP process is used to planarize both die level and wafer level topography and also to remove overfill metal and metalloid materials that serve as interconnects in an integrated circuit CMP pads and slurries are used together in combination on a polishing tool multiple times throughout the semiconductor .

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Chemical Polishing Systems Chemical Mechanical Polishing ,

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